宗旨和范围
Plasma Sources Science and Technology is an international journal dedicated solely to non-fusion aspects of plasma science. The Journal was founded in 1992 by Professor Noah Hershkowitz of the University of Wisconsin–Madison who also served as Editor-in-Chief until 2007. Mark J. Kushner of the Michigan Institute for Plasma Science and Engineering, University of Michigan took over the leadership of the journal until 2013 when Professor Bill Graham, Queen's University Belfast, became Editor-in-Chief. Professor Graham was followed by Professor Uwe Czarnetzki, Ruhr University Bochum, who became Editor-in-Chief in 2017. Professor Czarnetzki is actively involved in the peer-review of every paper. Less
关键指标
期刊详情
- 出版商IOP PUBLISHING LTD
- 出版语言English
- 出版频率Bi-monthly
- 出版语言English
- 出版频率Bi-monthly
- 创刊年份1992
- Publisher URL
- 网址
月数 | 发表论文百分比 |
---|---|
0-3 | 12% |
4-6 | 58% |
7-9 | 19% |
>9 | 11% |
Topics Covered
年度发行情况
- 5Y
- 10Y
常见问题
Plasma Sources Science and Technology 是从何时开始发行的?
Plasma Sources Science and Technology 自1992开始发行至今。
Plasma Sources Science and Technology 多久发行一次?
Plasma Sources Science and Technology 为Bi-monthly。
Plasma Sources Science and Technology 的出版商是谁?
Plasma Sources Science and Technology 的出版商是IOP PUBLISHING LTD。
我在哪里查看 Plasma Sources Science and Technology 的宗旨和范围?
查看 Plasma Sources Science and Technology 的宗旨和范围,请点击此处。
我如何在意得辑上查看Plasma Sources Science and Technology 的指标?
查看 Plasma Sources Science and Technology 的指标,请单击此处。
Plasma Sources Science and Technology 的 eISSN和pISSN 号分别是什么?
1361-6595 的 eISSN 为 0963-0252,pISSN 为 Plasma Sources Science and Technology 。
该期刊重点关注哪些主题?
本期刊关注的主题范围广泛,包括 Plasma jet, Argon, Ion energy, Electron density, Dielectric barrier discharge, Distribution function, Amplitude, Simulation, Frequency, Atmospheric pressure, External circuit, Power absorption, Plasma density, Electric field, Joule heating, Infrared, Tantalum, Electron temperature, Voltage pulse, Boltzmann equation。
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选择与您研究领域紧密相关的期刊,有助于确保您的学术成果能够触及最合适的读者群体, 从而最大化您的学术影响力和对该领域的贡献。
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